Zeiss’s ORION NanoFab multi-column (GFIS, and Gallium-FIB) Helium Ion Microscope (HIM) and Focused Ion Beam (Gallium- FIB)
The HIM beam is capable of providing sub 0.5 nm image resolution, with a beam energy range of 10 to 30 kV, and beam current range from 0.1 to 100 pA.
The Gallium FIB column can provide sub 3 nm resolution at 30 kV, with beam energy from 1 pA to 100 nA.
The system contains an Airlock chamber providing a sample exchange time of 3 min. It uses an Everhart Thornley Secondary Electron Detector, and is also equipped with an Electron flood gun for imaging non-conductive samples and materials.
It is capable of producing 4k image sizes. The NanoPatterning and visualization engine uses a 16 bit scan generator, and dual signal acquisition modules.
Also equipped on this tool is a Gas Injection System (GIS) from Oxford Instruments for nano structure Direct-Write lithography. The GIS contains three precursor gases, Tungsten (W), Xenon Difluoride (XeF2), and Tetraethyl Orthosillicate (TEOS).
Download the ORION NanoFab Brochure (PDF version, 5.20 MB)