Samco RIE-110iP Etching System

Samco RIE-110iP Etching System

The Samco RIE-110iP is an inductively coupled plasma etcher that provides both fluorine and chlorine-based etch chemistries for anisotropic etching of semiconductor wafers.

It is primarily used for patterning silicon and III-V wafers for nanophotonic structures.

Download the Samco RIE-110iP Etching System Brochure (PDF version, 274 KB)

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