SEM + Electron Beam Lithography – Raith Pioneer

Raith Pioneer SEM and EBL tool.

Raith Pioneer System (ARC 333B) - Nano-Fabrication Tool

The Raith Pioneer is an Electron Beam Lithography (EBL) system integrated with a Scanning Electron Microscope (SEM). This allows users to analyze the structural composition of their nanostructures.

This unit includes a laser interferometer translation stage. It also possesses two electron detectors: in-line and scattering. The maximum acceleration voltage for this system is 30 kV.

This tool has two parts, Scanning Electron Microscope (SEM) and Electron Beam Lithography (EBL). Priority is given to users looking to use the tool for lithography purposes. 
 
Download the Raith Pioneer Brochure (PDF version, 2,283 KB)
 
Scanning Electron Microscope (SEM)
  • Rating: SEM- Difficulty: 5/10, (1 being easy, 10 being very difficult)
  • Time needed to be trained: 5-15 hours
  • Prerequisites:
  1. Hands on lab experience
  2. Gemini 500 SEM
  3. Good hand-eye coordination
  4. General knowledge of how a focused electron beam interacts with materials

 

Electron Beam Lithography (EBL)
  • Rating: EBL- Difficulty 8/10, (1 being easy, 10 being very difficult)
  • Time needed to be trained: 20+ hours
  • Prerequisites:
  1. Gemini 500 SEM
  2. Spin processor
  3. CAD layouts
  4. Coordinate transformation systems
  5. Electron beam physics (Proximity effects, Electron optics, etc.)
  6. Organic polymers

 

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