SAMCO RIE-110iP Etching System
The SAMCO RIE-110iP is an inductively coupled plasma etcher that provides both fluorine and chlorine-based etch chemistries for anisotropic etching of semiconductor wafers.
It is primarily used for patterning silicon and III-V wafers for nanophotonic structures.
Download the SAMCO RIE-110iP Etching System Brochure (PDF version, 274 KB)