Rapid Thermal Annealing System –
Solaris 100, Surface Science Integration (SSI)
The Solaris 100 is a manual loading RTA system for research and development and pre-production:
- Wafer Capability: 1″ to 4″
- Operating Temperature Range: Room temperature to 1250 °C
- Option of top side or bottom side heating to reduce non-uniform heating
- 9 different graphing options
- Excellent repeatability