Rapid Thermal Annealing System – Solaris 100, Surface Science Integration (SSI)

Photo of RTA System with computer

Rapid Thermal Annealing System –
Solaris 100, Surface Science Integration (SSI)

The Solaris 100 is a manual loading RTA system for research and development and pre-production:

  • Wafer Capability: 1″ to 4″
  • Operating Temperature Range: Room temperature to 1250 °C
  • Option of top side or bottom side heating to reduce non-uniform heating
  • 9 different graphing options
  • Excellent repeatability
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